Materials, technology, and reliability for advanced interconnects and low-k dielectrics :
Materials, technology, and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A /
editors, G.S. Oehrlein ... [et al.].
- Materials Research Society, c2001.
- 1 v. (various pagings) : ill. ; 24 cm.
- (Materials Research Society symposium proceedings ; v. 612) .
- Materials Research Society symposia proceedings ; v. 612. .
Includes bibliographical references and indexes.
155899520X
Semiconductors--Materials--Congresses.
Semiconductors--Junctions--Congresses.
Dielectric films--Congresses.
Integrated circuits--Materials--Congresses.
Integrated circuits--Reliability--Congresses.
620.22
Includes bibliographical references and indexes.
155899520X
Semiconductors--Materials--Congresses.
Semiconductors--Junctions--Congresses.
Dielectric films--Congresses.
Integrated circuits--Materials--Congresses.
Integrated circuits--Reliability--Congresses.
620.22