000			02604nam a22003738i 4500
001			CR9780511529511
003			UkCbUP
005			20200124160235.0
006			m|||||o||d||||||||
007			cr||||||||||||
008			090409s1999||||enk o ||1 0|eng|d
020			_a9780511529511 (ebook)
020			_z9780521591751 (hardback)
020			_z9780521018005 (paperback)
040			_aUkCbUP _beng _erda _cUkCbUP
050	0	0	_aTK7871.85 _b.H54 1999
082	0	0	_a621.3815/2 _221
100	1		_aHitchon, W. Nicholas G., _eauthor.
245	1	0	_aPlasma processes for semiconductor fabrication / _cW.N.G. Hitchon.
264		1	_aCambridge : _bCambridge University Press, _c1999.
300			_a1 online resource (ix, 221 pages) : _bdigital, PDF file(s).
336			_atext _btxt _2rdacontent
337			_acomputer _bc _2rdamedia
338			_aonline resource _bcr _2rdacarrier
490	1		_aCambridge studies in semiconductor physics and microelectronic engineering ; _v8
500			_aTitle from publisher's bibliographic system (viewed on 05 Oct 2015).
505	0		_a1. Introduction -- 2. Plasma Processes for Semiconductors -- 3. Plasma Electromagnetics and Circuit Models -- 4. Plasma Models -- 5. Plasma Chemistry -- 6. Transport at Long Mean Free Path -- 7. Evolution of the Trench -- 8. Physical Description of the Plasma -- 9. Going Further.
520			_aPlasma processing is a central technique in the fabrication of semiconductor devices. This self-contained book provides an up-to-date description of plasma etching and deposition in semiconductor fabrication. It presents the basic physics and chemistry of these processes, and shows how they can be accurately modelled. The author begins with an overview of plasma reactors, and discusses the various models for understanding plasma processes. He then covers plasma chemistry, and describes in detail the modelling of complex plasma systems, with reference to experimental results. The book closes with a useful glossary of technical terms. No prior knowledge of plasma physics is assumed in the book. It contains many exercises and will serve as an ideal introduction to plasma processing and technology for graduate students of electrical engineering and materials science. It will also be a useful reference for practising engineers in the semiconductor industry.
650		0	_aSemiconductors _xEtching.
650		0	_aPlasma etching.
776	0	8	_iPrint version: _z9780521591751
830		0	_aCambridge studies in semiconductor physics and microelectronic engineering ; _v8.
856	4	0	_uhttps://doi.org/10.1017/CBO9780511529511
999			_c517990 _d517988