| 000 | 02714nam a22003618i 4500 | ||
|---|---|---|---|
| 001 | CR9780511524325 | ||
| 003 | UkCbUP | ||
| 005 | 20200124160316.0 | ||
| 006 | m|||||o||d|||||||| | ||
| 007 | cr|||||||||||| | ||
| 008 | 090402s1997||||enk o ||1 0|eng|d | ||
| 020 | _a9780511524325 (ebook) | ||
| 020 | _z9780521440226 (hardback) | ||
| 020 | _z9780521020305 (paperback) | ||
| 040 |
_aUkCbUP _beng _erda _cUkCbUP |
||
| 050 | 0 | 0 |
_aQC794.6.C6 _bA824 1997 |
| 082 | 0 | 0 |
_a539.7574 _223 |
| 245 | 0 | 0 |
_aAtomic and ion collisions in solids and at surfaces : _btheory, simulation and applications / _cedited by Roger Smith ; [contributors], Roger Smith [and others]. |
| 246 | 3 | _aAtomic & Ion Collisions in Solids & at Surfaces | |
| 264 | 1 |
_aCambridge : _bCambridge University Press, _c1997. |
|
| 300 |
_a1 online resource (ix, 309 pages) : _bdigital, PDF file(s). |
||
| 336 |
_atext _btxt _2rdacontent |
||
| 337 |
_acomputer _bc _2rdamedia |
||
| 338 |
_aonline resource _bcr _2rdacarrier |
||
| 500 | _aTitle from publisher's bibliographic system (viewed on 05 Oct 2015). | ||
| 505 | 0 | 0 |
_g1. _tIntroduction -- _g2. _tThe binary collision -- _g3. _tInteratomic potentials -- _g4. _tElectronic energy loss models -- _g5. _tTransport models -- _g6. _tThe rest distribution of primary ions in amorphous targets -- _g7. _tBinary collision algorithms -- _g8. _tMolecular dynamics -- _g9. _tSurface topography. |
| 520 | _aThis 1997 book is an introduction to the application of computer simulation and theory in the study of the interaction of energetic particles (< 1 eV to the MeV range) with solid surfaces. The authors describe methods which are applicable both to hard collisions between nuclear cores of atoms down to soft interactions, where chemical effects or long-range forces dominate. In surface science, potential applications include surface atomic structure determination using ion scattering spectroscopy or element analysis using SIMS or other techniques that involve depth profiling. Industrial applications include optical or hard coating deposition, ion implantation in semiconductor device manufacture or nanotechnology. Plasma-sidewall interaction in fusion devices may also be studied using the techniques described. This book will be of interest to graduate students and researchers, both academic and industrial, in surface science, semiconductor engineering, thin-film deposition and particle-surface interactions, in departments of physics, chemistry and electrical engineering. | ||
| 650 | 0 | _aCollisions (Nuclear physics) | |
| 650 | 0 |
_aSolids _xSurfaces. |
|
| 700 | 1 |
_aSmith, Roger, _d1947 January 9- _eeditor. |
|
| 776 | 0 | 8 |
_iPrint version: _z9780521440226 |
| 856 | 4 | 0 | _uhttps://doi.org/10.1017/CBO9780511524325 |
| 999 |
_c521506 _d521504 |
||