Materials, technology, and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A / editors, G.S. Oehrlein ... [et al.].

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TextSeries: Materials Research Society symposia proceedings ; v. 612.Publication details: Warrendale, Pa. : Materials Research Society, c2001.Description: 1 v. (various pagings) : ill. ; 24 cmISBN:

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Item type	Current library	Call number	Copy number	Status	Date due	Barcode
წიგნი	ეროვნული სამეცნიერო ბიბლიოთეკა 1 საცავი. 1 კორპ.	620.22 (Browse shelf(Opens below))	2E60187	Available		2010-611346

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Previous	620.22 Laser-beam interactions with materials :	620.22 Surface-controlled nanoscale materials for high-added-value applications :	620.22 Atomistic mechanisms in beam synthesis and irradiation of materials :	620.22 Materials, technology, and reliability for advanced interconnects and low-k dielectrics :	620.22 არაორგანული მასალათმცოდნეობის თანამედროვე ტექნოლოგიები და მეთოდები :	620.22 Новые защитные покрытия и средства материалы и технологические процессы. Вып. 3 /	620.22 Tribological aspects of aluminium extrusion dies /	Next

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